code wiki / _hdl_build / nx_cleanroom_gate.nx
nx_cleanroom_gate.nx
buildroot/runtime/_hdl_build/nx_cleanroom_gate.nx
about
nx_cleanroom_gate.nx -- GATE: can an ENCLOSED (3D-printer-type) chamber match a clean room? Required cleanliness
scales with feature size, so the answer depends on the node.
T1 OUR NODE -- at 10um (our sovereign/doomsday node) the required class is ISO 7; an enclosed HEPA laminar chamber
achieves ISO 5 -> it MEETS, with CMU-class yield. An enclosed system = clean-room-equivalent here.
T2 OPEN AIR -- a bare open bench (ISO 9) does NOT meet even the 10um requirement: you DO need an enclosure (not raw air).
T3 CROSSOVER -- enclosed ULPA (ISO 3) handles down to ~100nm, but NOT a 5nm leading-edge node -- THAT still needs a
full ISO-1 clean room. The honest limit: enclosure suffices for micron/sub-micron, not nanometer.
T4 YIELD -- meeting the requirement gives 943 permil yield vs 120 when contaminated.
T5 NEVER-BRICK-- deterministic.
GREEN iff all. Sovereign nx_cc->nxasm. expect_exit: 0 license_tier: ORIGINAL
dependencies 2 imports · 0 importers
imports: nx_cleanroom.nxnx_syscalls.nx
imported by: nobody (leaf or entry point)
call flow from main pre-order; caps 40 nodes / depth 6 declared; ↻ = already shown
structs
| none |
consts
| none |
functions
| 14 | func w(s: *u8) -> i64 { var n: i64=0; while s[n]!=(0 as u8){n=n+1} sys_write(1,s,n); return 0 } |
| 15 | func wn(v: i64) -> i64 { var m: i64=v; if m<0{w("-" as *u8);m=0-m} let t:*u8=sys_mmap(24); var k:i64=0; if m==0{t[0]=48 as u8;k=1} while m>0{t[k]=(48+(m%10)) as u8;m=m/10;k=k+1} var i:i64=0; let o:*u8=sys_mmap(24); while i<k{o[i]=t[k-1-i];i=i+1} sys_write(1,o,k); return 0 } |
| 17 | func main() -> i64 |