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nx_litho_stepper_test.nx

buildroot/runtime/_hdl_build/nx_litho_stepper_test.nx

5144 B85 linesdepth 6pulls 7 transitivereach 0 importersview sourcekind gate/prooftopic litho

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nx_litho_stepper_test.nx -- ACCEPTANCE GATE for the maskless-stepper exposure control. Exact KATs: resist clearing window [80,120] mJ/cm^2, nominal 100, intensity 50 mW/cm^2 (so 2000ms = 100 mJ), CD bias 5 nm/mJ, drawn CD 1000nm, CD tol 150nm, depth of focus 2000nm.

dependencies 2 imports · 0 importers

imports: nx_litho_stepper.nxnx_syscalls.nx

imported by: nobody (leaf or entry point)

call flow from main pre-order; caps 40 nodes / depth 6 declared; ↻ = already shown

structs

none

consts

none

functions

7	func lt_puts(s: *u8) -> i64 { var n: i64=0; while s[n]!=(0 as u8){n=n+1} sys_write(1,s,n); return 0 } called by 1: main calls 1: sys_write
8	func lt_putn(v: i64) -> i64 { let bb: u8=sys_mmap(28); var m: i64=v; if m<0{m=0-m;sys_write(1,"-" as u8,1)} let t: *u8=sys_mmap(28); var k: i64=0; if m==0{t[0]=48 as u8;k=1} while m>0{t[k]=(48+(m%10)) as u8;m=m/10;k=k+1} var i: i64=0; while i<k{bb[i]=t[k-1-i];i=i+1} sys_write(1,bb,k); return 0 } called by 1: main calls 2: sys_mmap sys_write
10	func main() -> i64 calls 14: sys_mmap ls_exposure_time_ms ls_actual_dose_mJ lt_puts lt_putn ls_dose_verdict+8