code wiki / _hdl_build / nx_maskless.nx
nx_maskless.nx
buildroot/runtime/_hdl_build/nx_maskless.nx
about
nx_maskless.nx -- LIB: MASKLESS lithography twin (DMD / projector direct-write, the CMU Hacker Fab approach). Instead
of a physical photomask (a mask shop = capital + a bought "vitamin" + slow iteration), a Digital Micromirror Device
projects the chip layout BITMAP straight onto the resist. Our sovereign layout (place-and-route -> per-layer bitmap)
feeds the DMD directly -> no mask shop, and a design change is just a NEW BITMAP (zero cost) so the fab is instantly
reprogrammable -- the researcher can iterate. Models: projected feature = DMD pixel / demagnification, the field of
view, field-stitching for larger dies, and the mask-shop cost eliminated. never-brick #26: pure arithmetic. license_tier: ORIGINAL
dependencies 1 imports · 1 importers
imports: nx_syscalls.nx
imported by: nx_maskless_gate.nx
structs
| none |
consts
| none |
functions
| 10 | func ml_feature_nm(dmd_pixel_nm: i64, demag: i64) -> i64 { if demag <= 0 { return 0 } return dmd_pixel_nm / demag } called by 1: main |
| 13 | func ml_field_um(dmd_pixels: i64, feature_nm: i64) -> i64 { return dmd_pixels * feature_nm / 1000 } called by 1: main |
| 16 | func ml_fields(die_um: i64, field_um: i64) -> i64 called by 1: main |
| 23 | func ml_mask_saved(layers: i64, mask_cost_each: i64) -> i64 { return layers * mask_cost_each } called by 1: main |
| 26 | func ml_reprogram_cost() -> i64 { return 0 } called by 1: main |