code wiki / _hdl_build / nx_maskless_gate.nx
nx_maskless_gate.nx
buildroot/runtime/_hdl_build/nx_maskless_gate.nx
about
nx_maskless_gate.nx -- GATE: maskless litho twin (DMD/projector, CMU Hacker Fab approach) -- no mask shop, reprogrammable.
T1 RESOLUTION -- a 7.6um DMD pixel at 10x demag -> 760nm projected feature (sub-micron, ~CMU's 1um target).
T2 FIELD -- 1920 mirrors x 760nm = a 1459um (1.46mm) field exposed in one shot.
T3 STITCH -- a 2mm die needs 2x2 = 4 stitched fields.
T4 NO MASK SHOP -- a 10-layer chip eliminates $5000 of masks; changing a layer = a NEW BITMAP at $0 (the researcher iterates free).
T5 NEVER-BRICK-- deterministic.
GREEN iff all. Sovereign nx_cc->nxasm. Our layout bitmap -> DMD -> resist directly: the sovereign design->light loop, no mask shop.
expect_exit: 0 license_tier: ORIGINAL
dependencies 2 imports · 0 importers
imports: nx_maskless.nxnx_syscalls.nx
imported by: nobody (leaf or entry point)
call flow from main pre-order; caps 40 nodes / depth 6 declared; ↻ = already shown
structs
| none |
consts
| none |
functions
| 12 | func w(s: *u8) -> i64 { var n: i64=0; while s[n]!=(0 as u8){n=n+1} sys_write(1,s,n); return 0 } |
| 13 | func wn(v: i64) -> i64 { var m: i64=v; if m<0{w("-" as *u8);m=0-m} let t:*u8=sys_mmap(24); var k:i64=0; if m==0{t[0]=48 as u8;k=1} while m>0{t[k]=(48+(m%10)) as u8;m=m/10;k=k+1} var i:i64=0; let o:*u8=sys_mmap(24); while i<k{o[i]=t[k-1-i];i=i+1} sys_write(1,o,k); return 0 } |
| 15 | func main() -> i64 |