nx_maskless_gate.nx source

1// nx_maskless_gate.nx -- GATE: maskless litho twin (DMD/projector, CMU Hacker Fab approach) -- no mask shop, reprogrammable. 2// T1 RESOLUTION -- a 7.6um DMD pixel at 10x demag -> 760nm projected feature (sub-micron, ~CMU's 1um target). 3// T2 FIELD -- 1920 mirrors x 760nm = a 1459um (1.46mm) field exposed in one shot. 4// T3 STITCH -- a 2mm die needs 2x2 = 4 stitched fields. 5// T4 NO MASK SHOP -- a 10-layer chip eliminates $5000 of masks; changing a layer = a NEW BITMAP at $0 (the researcher iterates free). 6// T5 NEVER-BRICK-- deterministic. 7// GREEN iff all. Sovereign nx_cc->nxasm. Our layout bitmap -> DMD -> resist directly: the sovereign design->light loop, no mask shop. 8// expect_exit: 0 license_tier: ORIGINAL 9import "nx_maskless.nx" 10import "nx_syscalls.nx" 11 12func w(s: *u8) -> i64 { var n: i64=0; while s[n]!=(0 as u8){n=n+1} sys_write(1,s,n); return 0 } 13func wn(v: i64) -> i64 { var m: i64=v; if m<0{w("-" as *u8);m=0-m} let t:*u8=sys_mmap(24); var k:i64=0; if m==0{t[0]=48 as u8;k=1} while m>0{t[k]=(48+(m%10)) as u8;m=m/10;k=k+1} var i:i64=0; let o:*u8=sys_mmap(24); while i<k{o[i]=t[k-1-i];i=i+1} sys_write(1,o,k); return 0 } 14 15func main() -> i64 { 16 w("=== nx_maskless_gate: maskless litho (DMD/projector; no mask shop; reprogrammable) ===\n" as *u8) 17 var pass: i64 = 0; var total: i64 = 0 18 19 // T1 resolution 20 let feat: i64 = ml_feature_nm(7600, 10) 21 total=total+1; if feat==760 { pass=pass+1; w(" [PASS] " as *u8) } else { w(" [FAIL] " as *u8) } 22 w("T1 resolution: 7.6um DMD pixel / 10x demag = " as *u8); wn(feat); w("nm projected feature (sub-micron)\n" as *u8) 23 24 // T2 field 25 let field: i64 = ml_field_um(1920, feat) 26 total=total+1; if field==1459 { pass=pass+1; w(" [PASS] " as *u8) } else { w(" [FAIL] " as *u8) } 27 w("T2 field: 1920 mirrors x 760nm = " as *u8); wn(field); w("um exposed per shot\n" as *u8) 28 29 // T3 stitch 30 let fields: i64 = ml_fields(2000, field) 31 total=total+1; if fields==4 { pass=pass+1; w(" [PASS] " as *u8) } else { w(" [FAIL] " as *u8) } 32 w("T3 stitch: a 2mm die needs " as *u8); wn(fields); w(" stitched fields\n" as *u8) 33 34 // T4 no mask shop 35 let saved: i64 = ml_mask_saved(10, 50000) 36 let reprog: i64 = ml_reprogram_cost() 37 total=total+1; if saved==500000 { if reprog==0 { pass=pass+1; w(" [PASS] " as *u8) } else { w(" [FAIL] " as *u8) } } else { w(" [FAIL] " as *u8) } 38 w("T4 no mask shop: 10-layer chip eliminates $" as *u8); wn(saved/100); w(" of masks ; redesign a layer = $" as *u8); wn(reprog); w(" (new bitmap, the researcher iterates free)\n" as *u8) 39 40 // T5 never-brick 41 let a: i64 = ml_feature_nm(7600, 10) 42 total=total+1; if a==feat { pass=pass+1; w(" [PASS] " as *u8) } else { w(" [FAIL] " as *u8) } 43 w("T5 never-brick: deterministic (" as *u8); wn(a); w("==" as *u8); wn(feat); w(")\n" as *u8) 44 45 w("\n=== nx_maskless_gate " as *u8); wn(pass); w("/" as *u8); wn(total) 46 if pass == total { w(" GREEN (maskless litho: sub-micron features, no mask shop, $0 redesign; our layout bitmap -> light directly)\n" as *u8); sys_exit(0); return 0 } 47 w(" RED\n" as *u8); sys_exit(1); return 1 48}